日本電子News Vol.41, 2009

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1

2 CD X Axis [mm] Y Axis [mm] - -

3

4 Magnification: 150k

5 (0, -30mm) 26 nm 24 nm 1 26 nm 26 nm (30mm, 0) Center (0, -30mm) 48 nm (0, 30mm) 48 nm 48 nm 48 nm 48 nm

6 E-beam resist Resist image Silicon mold Dose condition Measurement area including holes ZEP520A 350 C/cm 2 D : 19.9 nm 3 : 1.6 nm New-CAR 100 C/cm 2 D : 22.8 nm 3 : 2.5 nm D: diameter 116 nm 36 nm

日本電子News Vol.41, 2009

日本電子News Vol.41, 2009 Vol. 41, 2009 Serving Advanced Technology Vol.41.2009...2...3...4...5...6...13...22...28...34...42...48, ü,,, ü, ü Example condition: 6kV, 120uA, 3hr Example Mehod: Back side Ar ion irradiation CP

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