「有機EL素子の基礎及びその作製技術」‐材料科学の基礎 第1号

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1 Material Matters Basics Vol. 1, No. 1 EL EL EL

2 EL EL 1, yahiro@isit.or.jp 2 yahiro@cstf.kyushu-u.ac.jp 3 adachi@cstf.kyushu-u.ac.jp 1 EL EL EL EL EL EL EL EL EL ITO ITO EL Appendix EL A A A A A A A A Appendix Appendix A A EL 1-1 Mechanoluminescence Photo-luminescence Electroluminescence ELChemiluminescence EL 1-1 EL EL EL OLED Organic Light Emitting Diode 1-1 EL EL EL EL ma/cm 2 2 Tel: Fax: sialjpts@sial.com

3 EL ka/cm 2 EL Indium-Tin Oxide:ITO EL 1-2 EL -1- EL 1953 A. Bernanose EL EL New York M. Pope NRC Canada W. Helfrich W. Helfrich EL EL -2- C. W. Tang EL EL EL 1987 C. W. Tang 100 nm EL 11 ITO 75 nm Tris 8-quinolinolate aluminum Alq 3 60 nm MgAg ITO 10 V 1,000 cd/m 2 1 EL EL EL EL Organic Photoconductor OPC 5 6, 7 EL LB EL 8, S. Hayashi Alq 3 Diamine 1-4 C. W. Tang EL EL 1 EL C. W. Tang EL EL EL C. Adachi 1-5 C. W. Tang 12, 13 Tel: Fax: safcjp@sial.com 3

4 EL Mg PV Emitter TPD Au Glass ) 1990 EL C. Hosokawa Y. Hamada Alq 3 EL 15 ITO TPD 16 TPD 12 PBD 13 Alq EL 26, 27 EL NTT 30 EL 77 K EL 5 8 C. Adachi S. Tokito , EL EL EL ,4'-bis (2,2-diphenylethenyl) biphenyl π PPV EL 17 PAT 18 PF π EL EL XL EL PAT PF 1-7 PAT PF 625 nm 520 nm 460 nm EL EL EL 23, Princeton Southern California EL 4 Tel: Fax: sialjpts@sial.com

5 EL 2 EL 2-1 EL EL / EL EL 2-1 Appendix r f ext -3.3 ev -3.8 ev Mg 0.9 Ag 0.1 Al -4.3 ev Mg 0.9 Ag 0.1 Al LiF Al 0.5 nm 1.0 nm LiF Mg 0.9 Ag CuPc LiF EL EL 38 LUMO 5.0eV ITO 2.6eV α-npd 3.3eV Alq 3 3.8eV MgAg 5.5eV 6.0eV HOMO γ EL η ext η f η r EL 2-1 EL EL 2-2 ITO/ α-npd 50 nm / Alq 3 50 nm / MgAg 150 nm / Ag 10 nm α-npd -5.5 ev Highest Occupied Molecular Orbital HOMO ITO ITO α-npd HOMO ITO -4.7 ev UV- ITO -5.0 ev Ultraviolet Photoelectron Spectroscopy UPS 35 CuPc 15 nm CuPc UPS 36 Lowest Unoccupied Molecular Orbital LUMO Alq 3 LUMO EL cm/v s π-π EL Space Charge Limited Current, SCLC 39 SCLC J A/cm 2 cm/v/s L m V VF/m J 9 8 εε μv L 2 0 = (2.1) nm 10-3 cm/v s EL 10V 30 A/cm Ir EL Intersystem Crossing ISC 100 Tel: Fax: safcjp@sial.com 5

6 EL S T 1 / / - / ITO/ TPD 40 nm / CBP 6wt - Ir ppy 3 20 nm / BCP 10 nm / Alq 3 30 nm / LiF 0.5 nm / Al 100 nm / / / / / S HOMO LUMO DCM Alq 3 Alq 3 DCM 2-4 DCM DCM 1mol MgAg LiF/Al EL Finite-difference time-domain FDTD ITO ITO 44 EL EL EL ext EL η φ = γ η η η ( ext) r f ext Appendix A EL Alq 3 LUMO3.0 ev DCM LUMO3.5 ev DCM HOMO5.6eV Alq 3 HOMO6.0eV 2-4 EL HOMO-LUMO UPS HOMO-LUMO EL 520 nm Ir ppy 3 α-npd TPD EL (Web 製品リスト ) HOMO HOMO EL EL 3 C. W. Tang 2-2 ITO/α-NPD 50 nm / Alq 3 50 nm / MgAg 150 nm / Ag 10 nm / / / DCM ITO/α-NPD 50 nm / Alq 3 1mol - DCM 50 nm / MgAg 150 nm / Ag 10 nm CuPc PEDOT/PSS m-tdata 6 Tel: Fax: sialjpts@sial.com

7 EL TPD α-npd TCTA BCP DPvBi CBP π Alq 3 BCP t-bu-pbd Flrpic Ir(ppy) 3 (ppy) 2 Ir(acac) Alq Coumarin DCM PPV PPV EL PPV MEH-PPV PF Alq 3 Zn-PBO Web DMQ DCM2 Aldrich Materials Science Tel: Fax: safcjp@sial.com 7

8 EL 3 EL 3-1 C-C C-H 3-1 g 10-3 Pa Train Sublimation (a) (b) 3-2 CuPc 3-3 Train Sublimation Heat ITO EL ITO Indium-Tin Oxide 10Ω/ ITO (c) ITO (a) 40mm (b) 3-1 Train Sublimation abc mm (c) ITO 3mm 2mm 4mm 2mm 3mm EL (d) 8 Tel: Fax: sialjpts@sial.com

9 EL (e) 3:1 1:3 vol ratio ITO ITO 10 ITO ITO ITO ITO IPA 5 ITO ITO IPA EL ITO IPA UV/ mm (a) (b) 3-4 1mm 3-3 EL EL m P Pa T K D m 45 λ = T / PD (3.1) EL Alq 3 46 Alq /cm -3 Alq 3 Alq nm 300K 1Pa 0.5 mm 10-3 Pa 50 cm 10-3 Pa 50 cm 3 30 cm 10-4 Pa Zn /m 2 s P Pa T K M g/mol Zn = P /( MT ) (3.2) 10-4 Pa 300 K M /m nm Alq /m 2 1 C-C 10-4 Pa 10-3 Pa H. Aziz 47 T. Ikeda Pa 1 2 Tel: Fax: safcjp@sial.com 9

10 EL ppm UV FET FET / FET Ta Mo BN K- 30cm EL cm rpm 10 cm 3-6 Mg Ag Ca LiF W Ta V W Al Al Cu E- Al W Li Cs 2 10 V 100 A Pt Ta Ta Ta Ta Ta Mg W V Ag, Au, LiF W Al, Ca Tel: Fax: sialjpts@sial.com

11 EL 3-8 Z-ratio Tooling Factor Tooling Factor EL nm 30 mg 10 mg ( X mol M host W host R host M gest W gest R gest W M host Wgest M gest W + M host gest gest host 100 mol% 3.3 = X M gest X W gest = W M 100 X host (3.4) W : W = R : R (3.5) host host gest host gest M gest X R gest = R M 100 X host (3.6) X EL 1 5 /s wt M host = g/mol Alq 3 M gest = g/mol DCM 1mol R = (3.7) gest R host Alq 3 R host =5 /s R gest =0.033 /s Tooling Factor Y 3 Y 3 R host =15 /s R gest =0.099 /s10 1 Tooling Factor 3 R gest 1 /10s R host = 15 /s Tooling Factor 3 1/3 Mg Ag 10 1 wt ratio 3-4 EL EL 20 V EL 1 pa 100 ma 1A nw mw cd/m 2 lm/w 0.1V 0.5V 15V Tel: Fax: safcjp@sial.com 11

12 4 EL EL ext int η φ ( ext) = N photon = ( P E) N career ( I e) P λ = I 5 P λ = I (4.5) lm/w e cd/a c EL J-V ext -J EL EL ma/cm External quantum efficiency ext η φ ( ext ) 100 (4.1) EL EL PW/m 2 1 E J E hν = hc λ = (4.2) h J sv s -1 c m s -1 m P W/m 2 E N photon s -1 m -2 P( W ) E( J ) = P( J s ) E( J ) 1 N photon = (4.3) 1 W1 1 J J s -1 I A EL N career s -1 m -2 A/m 2 e C=A s N career ext = I( A) e( C) = I( A) e( A s 1 ) (4.4) Appendix Mlm/m 2 P W/m 2 y K m 683 lm/w M ( λ) P Km y( λ) = (4.6) EL EL M λ') = P K y( λ') F( λ') F( λ) dλ ( m (4.7) F( λ') M ( λ') dλ' = P K m y( λ') dλ' F( λ) dλ M M M = P K m F( λ') y( λ') dλ' F( λ) dλ (4.9) (4.8) EL M lm/m 2 M = P K L cd/m 2 m F( λ) y( λ) dλ F( λ) dλ M L = π (4.11) (4.10) EL EL W J/s EL EL W/m 2 W/m 2 L cd/m 2 M lm/m 2 P W/m Tel: Fax: sialjpts@sial.com

13 W 555nm 1 lm lm/m 2 cd cd/m 2 lx L-V 2.5 V EL 4 1 L cd/m 2 M lm/m 2 P W/m 2 1 L cd/m 2 1 π π /683 2 M lm/m 2 1/π 1 1/683 2 P W/m /π nm K m =683 lm/w 555 nm 4-2 EL ITO/α-NPD 50 nm / Alq 3 50 nm / MgAg 150 nm / Ag 10 nm J - V V 2.5 V EL EL V10V ma/cm L-J Ex - J Alq 3 α-npd J-V L - J EL Ex-J Tel: Fax: safcjp@sial.com 13

14 EL PL EL PL EL EL PL 5 EL EL EL EL Appendix EL PL UV-Vis UV-Vis PL Appendix PL 4-5 DCM Alq 3 1) A. Bernanose, M. Conte, P Vouauzx, J. Chim. Phys., 1953, 50, 64. 2) M. Pope, H. P. Kallmann, P. Magnante, J. Chem. Phys., 1963, 38, ) W. Herfrich and W. G. Schneider, Phys. Rev. Lett., 1965, 14, ) W. Herfrich and W. G. Schneider, J. Chem. Phys., 1965, 44, ) W. D. Gill, J. Appl. Phys., 1972, 43, ) G. Pfister, Phys. Rev., 1977, B 16, ) P. M. Borsenberger, W. Mey and A. Chowdy, J. Appl. Phys., 1978, 49, ) P. S. Vincett, W. A. Barlow and R. A. Hann, Thin Solid Films., 1982, 94, ) G. G. Roberts, M. M. McGinniity, W. A. Barlow, P. S. Vincett, Solid State Commun., 1979, 32, ) S. Hayashi, T. T. Wang, S. Matsuoka, S. Saito, Mol. Cryst. Liq. Cryst., 1986, 135, ) C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett., 1987, 51, ) C. Adachi, S. Tokito, T. Tsutsui and S. Saito, Jpn. J. Appl. Phys., 1988, 27, L ) C. Adachi, S. Tokito, T. Tsutsui and S. Saito, Jpn. J. Appl. Phys., 1988, 27, L ) C. Hosokawa, H. Higashi, H. Nakamura, T. Kusumoto, Appl, Phys. Lett., 1995, 67, ) Y. Hamada, T. Sano, M. Fijita, T. Fujii, Y. Nishio and K. Shibata, Jpn. J. Appl. Phys., 1993, 32, L ) Y. Shirota, Y. Kuwabara and H. Inaba, Appl. Phys. Lett., 1994, 65, ) J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackay, R. H. Friend, P. L. Burns and A. B. Holmes, Nature, 1990, 347, ) Y. Ohmori, M. Uchida, K. Muro and K. Yoshino, Jpn. J. Appl. Phys., 1991, 30, L ) Y. Ohmori, M. Uchida, K. Muro and K. Yoshino, Jpn. J. Appl. Phys., 1991, 30, L ) A. R. Brown, D. D. C. Bradley, J. H. Burroughes, R. H. Friend, N. C. Greenham, P. L. Burn, A. B. Holmes and A. Kraft, Appl. Phys. Lett., 1992, 61, ) J. Kido, H. Shionoya and K. Nagai, Appl. Phys. Lett., 1992, 67, ) T. Wakimoto, Y. Fukuda, K. Nagayama, A. Yokoi, H. Nakata, M. Tsuchida, IEEE Transactions Electron Devices, 1997, 44, ) N. Takada, T. Tsutsui and S. Saito, Appl. Phys. Lett., 1993, 63, ) 1998, 36, ) EL 19 p18. 26) M. A. Baldo, S. Lamansky, P. E. Burrows, M. E. Tompson, S. R. Forrest, Appl, Phys. Lett., 1999, 75, 4. 27) M. A. Baldo, D. F. O Brien, Y. You, A. Shoustikov, A. Aibley, M. E. Thompson and S. R. Forrest, Nature, 1998, 395, ) T. Tsutsui, M. Yang, M. Yahiro, K. Nakamura, T. Watanabe, T. Tsuji, Y. Fukuda, T. Wakimoto, S. Miyaguchi, Jpn. J. Appl. Phys., 1999, 38, L ) , p ) S. Hoshino and H. Suzuki, Appl. Phys. Lett., 1996, 69, ) C. Adachi, M. A. Baldo, S. R. Forrest and M. E. Tompson, Appl. Phys. Lett., 2000, 77, ) C. Adachi, M. A. Baldo, S. R. Forrest, S. Lamansky, M. E. Thopmson and R. C. Kwong, Appl. Phys. Lett., 2001, 78, ) C. Adachi, R. C. Kwong, P. Djurovich, V. Adamovich, M. A. Baldo, M. E. Thompson and S. R. Forrest, Appl. Phys. Lett., 2001, 79, ) S. Tokito, T. Iijima, Y. Suzuki and F. Sato, Appl. Phy, Lett,. 2003, 83, ) K. Sugiyama, H. Ishii, Y. Ouchi and K. Seki, J. Appl. Phys., 2000, 87, ) EL , p ) T. Wakimoto, Y. Fukuda, K. Nagayama, A. Yokoi, H. Nakada and M. Tsuchida, IEEE Trans. Electron Devices, 1997, 44, ) Y. Sato, T. Ogata, S.Ichisawa, M.Fugono and H. Kanai, Proc. SPIE, 1999, 3797, ) P. E. Burrows, Z. Shen, V. Bulovic, D. M. McCarty, S. R. Forrest, J. A. Cronin and S. R. Forrest, J. Appl. Phys., 1996, 79, ) N. C. Greenham, R. H. Friend and D. D. C. Bradlay, Adv. Mater., 1994, 6, ) 50 No3, 2003, ) G. Gu, D. Z. Garbuzov, P. E. Burrows, S. Venkatesh, S. R. Forrest and M. E. Thompson, Opt. Lett., 1997, 22, ) S. Moller and S. R. Forrest, J. Appl. Phys., 2002, 91, ) M. Fujita, T. Ueno, T. Asano, S. Noda, H. Ohhata, T. Tsuji, H. Nakada, N. Shimoji, Electron. Lett., 2003, 39, ) ) P. E. Burrows, Z. Shen, V. Bulobic D. M. McCarry, S. R. Forrest, J. A. Cronin, M.E. Tompson, J. Appl. Phys., 1996, 79, ) H. Aziz, Z. D. Popovic, S. Xie, A. M. Hor, N. X. Hu, C. Tripp, G. Xu, Appl. Phys. Lett., 1998, 72, ) T. Ikeda, H. Murata, Y. Kinoshita, J. Shike, Y. Ikeda, M. Kitano, Chem. Phys. Lett., 2006, 426, Tel: Fax: sialjpts@sial.com

15 EL Appendix EL M W A1-1 4 EL lm/w cd/a A1-1-1 int c L r f ext EL A1-2 A1-2-1 int r f A-2.1 N p N e A -1 I I e I h I e I h I r A-2.2 A-2.3 I A P W S m 2 m e C h J s Anode Organic layer Cathode A1-1-2 e A -1 EL Tel: Fax: safcjp@sial.com 15

16 EL I r I I = I h = I e I h = I e = 0 I = I h = I e = I r =1.0 I = I h > I e I h 0 I e = 0 I = I h = I e + I h I r = I e = I h - I h cm -3 A A-2.12 T S int 5 1 A-2.9A-2.14A-2.15 I = I e > I h I e 0 I h = 0 I = I e = I h + I e I r = I h = I e - I e I h 0, I e 0 A r r eh TS 3:1 r S dir S int 0.40 f f 1 EL 1 f f f f K r =1 / T r T r K t EL K nr f Triplet-Triplet annihilation A-2.10A-2.11A T* A A A-2.18 f = 1.0 K nr > K r f < Alq 3 1 EL Tel: Fax: sialjpts@sial.com

17 EL A1-2-2 A -2 ext 3 A -2 Rf: Rb: θc: Ωc: d: EL c c c Ω Ω ext c 1.7 A A m R f R b R f R b EL TE transverse electric modetm transverse magnetic mode 50 c R f R b R f 520 nm R b / 0.90 m = 0.95 ext =18 EL 80 n >1.0 ext n org c 1-cos θ sin 2 θ /2 n org 1.0 A-2.21 A-2.21 c R f EL / R b m ext r 0.25 f 1.0 A1-3 EL E ext ext P in W/m 2 P em W/m 2 E int P em / P in V V J A/m 2 P in = J V 1 hc / h c P em hc / F P em A-3.1 F 0 P em L U A-3.1 E int A-3.2 int Tel: Fax: safcjp@sial.com 17

18 EL N in N em N em / N in J / e - J / e J A/m 2 N in = J / e e int P W L cd/m 2 L cd/m 2 EL F y M lm/m 2 EL O R m 0 rad +d ds E p E p = P em / N em dsr EL I cdd dm lm A-3.2A-3.5 E int int A-3.6 M lm I 0 cd M lm E ext ext EL L 0 cd/m 2 M lm/m 2 A1-4 EL 0 π/2 = π/2 M lm/m nm W lm K m 680 lm/w EL M lm/m 2 A-3.2 A-4.8A-4.9 F 0 A-3.2A-3.7A-4.10 E ext A-3.4A-3.8 A-4.10 ext A-4.11A Tel: Fax: sialjpts@sial.com

19 EL A-4.11A-4.12 m A-4.11A CMY Cyan MagentaYellow 3 CMY A-4.13 A Appendix - 3 PL Alq 3 DCM DCM EL Appendix A3-1 2 RGB Red Green Blue 3 RGB 3 RGB A -1 A3-2 CRT CIE CIE CIE Commission Internationale de l Eclairage RGB 3 RGB RGB 1 R G B 2 xy CIE1931 NTSC National Television Standards Committee 1953 CRT NTSC CRT R 0.67,0.33G 0.21,0.71B 0.14,0.08 W 0.310,0.316 NTSC A -2 CIE1931 Tel: Fax: safcjp@sial.com 19

20 TM Aldrich TM TM Vol. 4, No. 1 Controlled Synthesis & Properties Morphing Materials into Meaning Alternative Energy the way to go Generation and Storage Vol. 3, No. 4 URL Material Matters sialjp@sial.com

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