Liner natomy ライナーの手引き Innovative Chromatography Products

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1 Liner natomy ライナーの手引き Innovative Chromatography Products

2 はじめに ( ) & ( ) Gerstel PTV PTV PTV(PROGRAMMABLE TEMPERATURE VAPORIZATION) LVI(LARGE VOLUME INJECTIONS) PTV LVI PTV LVI ( PETN 100 ( 0.53mm 2-3 ) PTV

3 ライナー充填物 Restek Restek プレシジョンライナーウール入り Restek Restek サイクロダブルテーパライナー

4 RESTEK の不活性化処理技術 ( ) Restek Restek TECH TIP: Restek Restek R

ID 容積と内径 Restek Solvent Expansion Calculator (www.restek.

Split/Splitless 2,060 1,030 3.5 mm ID 2010 GC Split/Splitless 914 457 4 mm ID Agilent GC Split/Splitless 900 450 5 mm ID Thermo TRACE GC Split/Splitless 2,000 1,000 3.

5 ID 容積と内径 Restek Solvent Expansion Calculator ( Sovent Expansion Calculator ( L) * 4 mm ID Agilent GC Split/Splitless mm ID Agilent GC Split/Splitless mm ID Thermo TRACE GC Split/Splitless 2,060 1, mm ID 2010 GC Split/Splitless mm ID Agilent GC Split/Splitless mm ID Thermo TRACE GC Split/Splitless 2,000 1, mm ID 2010 GC Split/Splitless Agilent GC Split/Splitless Agilent GC Split/Splitless mm ID Agilent GC Split/Splitless mm ID Agilent GC PTV * ( ) 0.18mm 0.15mm 0.10mm 1 2 (psi) ( ) ( L) 159 1, psi 1.5mL/min 0.25mm 30m 40

6 ライナーメンテナス ( ) (+10 )

7 形状 ( ) Restek プレシジョンライナーウール入り Restek シングルテーパライナー TECH TIP: EPC GC ( ) Restek ダブルテーパライナー Restek シングルテーパライナーウール入り Restek サイクロダブルテーパーライナーユニライナー下側ホール

8 Topaz GC Topaz GCインレットライナーの革新的技術とその不活性度は次のレベルへ : GC 100 Topaz ライナーは 100% 満足度保証 Topaz Topaz

9 不活性化 Topaz Restek DNP 2 1 µg/ml 1. Acenaphthene (IS) ,4-Dinitrophenol (DNP) 1 1. t R (min) (µg/ml) 1. Carbaryl :Rxi-5ms,15m,0.25mmID,0.25µm(Cat.#13420); :Topaz FID liner ; : ; : 1µL (hold 1min); :Topaz4.0mmID, (Cat.#23303); :250 ; :40mL/min; :40 (1min)-18.5 / min-300 (1min); :He, ; :2mL/min; :FID@340 ; :45mL/min :N2;H2 :40mL/min;Air :400mL/min;Data Rate:50Hz; :Agilent 7890AGC 1 2 = Topaz A = Topaz A Time (min) GC_EV Time (min) GC_EV DDT (Topaz EPA 8081 DDT 15% ) 1 Endrin Endrin Breakdown 2 3 DDT DDT Breakdown Topaz (Blue) ( ) 2.1% 1.5% Competitor C C (Red) 17.0% 3.9% ( ) 17.0% 3.9% Time (min) GC_EV t R (min) (ng/ml) 1. 4,4'-DDE * 2. Endrin ,4'-DDD * 4. Endrin aldehyde * 5. 4,4'-DDT Endrin ketone * * 6 ( ) Topaz Topaz 2,4- DNP DDT GC :Rxi-5ms,15m,0.25mmID,0.25µm(Cat.#13420); :Endrin(50ng/mL) DDT(100ng/mL); :n- ; : 1µL (hold 1.2min); :Topaz4.0mmID, (Cat.#23303); :250 ; :20mL/min; :50 (1.2min)-20 /min /min-265 ; :He, ; :1.5mL/min; :ECD@300 ; :60mL/min :N2;Data Rate:20Hz; :Agilent 7890AGC

10 再現性 Topaz Restek Topaz Restek Topaz 4 (DDT 2 4-DNP ) 5 t R (min) (ng/ml) 1. 4,4 -DDE * 2. Endrin ,4 -DDD * 4. Endrin aldehyde * 5. 4,4 -DDT Endrin ketone * * t R (min) (µg/ml) 1. Acenaphthene (IS) ,4-Dinitrophenol (DNP) Carbaryl Coumaphos Endrin DDT Lot# Endrin DDT Lot # 1 Breakdown 2.1% Breakdown 1.2% 1 2.1% 1.2% 2 2.4% 1.4% 2.4% 1.4% 3 2.1% 1.4% 1 2, 4-DNP Carbaryl Coumaphos Lot# RRF RRF RRF 2, 4-DNP 1 Lot # RRF Lot 3 Lot 3 Lot 2 Lot 2 Lot 1 Lot Time (min) GC_EV Time (min) GC_QA0101 GC_EV1450 :Rxi-5ms,15m,0.25mmID,0.25µm(Cat.#13420); :Endrin(50ng/mL) DDT(100ng/mL); :n- ; : 1µL (hold 1.2min); :Topaz4.0mmID, (Cat.#23303); :250 ; :20mL/min; :50 (1.2min)-20 /min /min-265 ; :He, ; :1.5mL/min; :- ECD@300 ; :60mL/min :N2;Data Rate:20Hz; :Agilent 7890AGC GC_QA0101 :Rxi-5ms,15m,0.25mmID,0.25µm(Cat.#13420); :Topaz FID liner ; : ; : 1µL (hold 1min); :Topaz4.0mmID, (Cat.#23303); :250 ; :40mL/min; :40 (1min)-18.5 /min-300 (1min); :He, ; :2mL/min; :- FID@340 ; :45mL/min :N2;H2 :40mL/min;Air :400mL/min;Data Rate:50Hz; :Agilent 7890AGC

11 生産性 Topaz 5 Endrin 繰り返し測定におけるエンドリン分解率の変化 Breakdown Across Multiple Injections 14.00% 12.00% % Endrin エンドリン分解率 Breakdown 10.00% 8.00% 6.00% 4.00% 2.00% 0.00% Injection 注入回数 # Topazライナー Liner Competitor 他社 A A Competitor 他社 B B See Figure 3 for conditions. 3 Topaz Topaz 究極の不活性処理再現性生産性 Topaz www. Restek.jp/topaz

さらに詳しくお知りになりたい場合 www.restek.com/liners GC (Webiner) PTV-On Column 1 2 PATENTS & TRADEMARKS Restek patents and trademarks are the property of Restek Corporation.

12 さらに詳しくお知りになりたい場合 GC (Webiner) PTV-On Column 1 2 PATENTS & TRADEMARKS Restek patents and trademarks are the property of Restek Corporation. Other trademarks appearing in Restek literature or on its website are the property of their respective owners. The Restek registered trademarks used here are registered in the United States and may also be registered in other countries. Restek [email protected] Restek patents and trademarks are the property of Restek Corporation. (See www. restek.jp/patents-trademarks for full list.) Other trademarks in Restek literature or on its website are the property of their respective owners. Restek registered trademarks are registered in the U.S. and may also be registered in other countries Restek Corporation. All rights reserved. Printed in Japan. Lit.Cat.#GNBR1678-UNV_JP

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