110 B U N S E K I K A G A K U Vol Fig. 1 system Schematic diagram of the plasma measurement Fig. 2 Photograph of a time-resolved obserbation

Size: px

Start display at page:

Download "110 B U N S E K I K A G A K U Vol Fig. 1 system Schematic diagram of the plasma measurement Fig. 2 Photograph of a time-resolved obserbation"

ときなこやぎ
6 years ago
Views:

1 BUNSEKI KAGAKU Vol. 63, No. 2, pp The Japan Society for Analytical Chemistry 109 ICP nl ICP ICP ICP He-ICP 3.4 khz Ar-ICP 17.3 khz He-ICP 24 ms Ar-ICP 130 ms He-ICP 3000 K 4000 K Ar-ICP 500 K 1000 K ICP 1 ips Alzheimer Parkinson ips 1 2 ppt ag g SPring-8 50 ag 3 nl 4 miya@plasma.es.titech.ac.jp 1 : J S/N ICP zg g ICP ICP 5 ICP ICP ICP ICP ICP Pspice Orcad

110 B U N S E K I K A G A K U Vol. 63 2014 Fig. 1 system Schematic diagram of the plasma measurement Fig.

2 110 B U N S E K I K A G A K U Vol Fig. 1 system Schematic diagram of the plasma measurement Fig. 2 Photograph of a time-resolved obserbation on Helium and Argon ICP under single-droplet sample introduction ICP 3.8 kw 7T84RB ICP 2 2 ICP pl 2 3 CNT-90, Spectracom Corp. NY, USA 10 mm Fig. 1 R cm wave-length resolution; nm HR4000, Ocean Optics Inc. FL, USA mm 50 mm ICP ICP ICP 60 / EXILIM PRO EX-F1 CASIO 20 L min 1 15 L min W 1080 W 30 μm 0.05 MPa 4.0 ms 5 nl ICP Fig Fig. 2 ICP 100 ms ICP 20 L min 1 15 L min 1 RF-power 720 W

3 : ICP 111 Fig. 3 Time-resolved frequeency mesurements on Helium and Argon ICP under the introduction of 5 nl droplets with 0.5 Hz Table 1 Evaluation of the RF resonant frequency by introducing droplets ARCOS Agilent 7700 Ocsilated frequency (MHz) With droplet introduction W/O droplet introduction nl 0.5 Hz Fig. 3 Fig. 3 a ICP 3.4 khz 24 ms Fig. 3 b ICP 17.3 khz 130 ms W m 1 K W m 1 K 1 10 ICP ICP ICP ICP Agilent 7700 SPECTRO ICP ARCOS Spectrometer SPECTRO ICP ARCOS 12 L min W 1.0 L min 1 ICP Table 1 ARCOS MHz MHz Agilent MHz MHz 3 2 ICP

4 112 B U N S E K I K A G A K U Vol Fig. 4 Time-resolved excitation temperature mesurements on Helium and Argon ICP under the introduction of 5 nl droplets with 0.5 Hz nm nm nm nm Fig. 4 a ICP 3000 K 4000 K Fig. 4 b ICP 500 K 1000 K ICP W m 1 K W m 1 K ICP 20 L min 1 15 L min W 1080 W 30 μm 4.0 ms Fig. 5 ICP ICP 5.8 nl 5 nl 3 4 ICP ICP ICP 20 L min 1 15 L min 1 30 μm 0.05 MPa 4.0 ms

5 : ICP 113 Fig. 5 Relation between the introduced droplet volume on the frequency shift Fig. 6 Relation between the RF-power on the frequency shift during droplet sample introduction Fig. 6 Fig. 6 5 ICP ICP ICP ICP 3 5 Fig W 1080 W 30 μm 0.05 MPa 1.0 ms Fig. 7 Fig. 7

6 114 B U N S E K I K A G A K U Vol Fig. 7 Relation between the plasma gas flow rate on the frequency shift during droplet sample introduction Fig. 8 Electrical equivalent circuit of ICP generation by an inductively copled mode Fig. 10 Electrical equivalent circuit used for an electric circuit simulation in which ICP was considerd as being generated with an inductively coupled mode Fig. 9 Electrical equivalent circuit of ICP generation by a capacitive copled mode 4 Pspice Orcad ICP Fig. 8 Lp Rp 6 ICP ICP ICP Fig. 9 Cp 7 ICP Fig. 10 Fig. 11 Fig. 10 Fig. 11 Fig. 10 L H

7 : ICP 115 Fig. 11 Electrical equivalent circuit used for an electric circuit simulation in which ICP was considerd as being generated with a capacitive coupled mode Fig. 13 Calculated electric circuit simulation results in which ICP was considerd as being generated with a capacitive coupled mode Fig. 12 Calculated electric circuit simulation results in which ICP was considerd as being generated with an inductively coupled mode 2 L = kµ 0 πa n 2 / b k μ 0 H m 1 a m b m n σ Ω α σ = σ T α σ m 2 T K 8 ICP 3600 K cm 3 ICP 7000 K cm 3 43 Ω 3 Ω ICP Fig. 10 Fig. 11 Fig. 12 Fig. 13 Fig. 12 Fig. 13 ICP

8 116 B U N S E K I K A G A K U Vol Table 2 Comparison of He and Ar ICP for droplet sample introduction Herium ICP Argon ICP Robustness for droplet introduction Strong Weak Frequency shift Small ( 3.4 khz) Large ( 17.3 khz) Fluctuation of Exc. Temp. Large ( 7000 K) Small ( 1500 K) Convergence time Fast ( 24 ms) Slow ( 130 ms) Energy copling Capacitive Inductive Inductive Capacitive 5 ICP 1000 ICP ICP ICP RF-power ICP Table 2 5 nl ICP ICP 3.4 khz 24 ms ICP 17.3 khz 130 ms ICP ICP 3000 K 4000 K ICP 500 K 1000 K ICP ICP ICP 1) H. Haraguchi : J. Anal. At. Spectrom., 19, 5 (2004). 2) : 77, 255 (2007). 3) : X 34, 133 (2003). 4) : (Bunseki Kagaku), 59, 363 (2010). 5) : (Bunseki Kagaku), 63, 101 (2014). 6) :, (2000), ( ). 7) : ( ), (2001), ( ). 6) :, (1965), ( ).

9 : ICP 117 Effects of Droplet Introduction into the ICP Sustained by Free-running RF-generator on Plasma Spectroscopic Characteristics Hidekazu MIYAHARA 1, Yuki KABURAKI 1, Takahiro IWAI 1 and Akitoshi OKINO 1 miya@plasma.es.titech.ac.jp 1 Department of Energy Sciences, Tokyo Instutute of Technology, J2-1303, 4259, Nagatsuta-cho, Midori-ku, Yokohama-shi, Kanagawa (Received August 22, 2013; Accepted October 9, 2013) For stable plasma generation under introducing large-size sample droplets to ICP, we designed and developed free-running ICP. In the system, the impedance shift of the plasma generated by introducing the droplet is immediately cancelled by a shift of the RF resonant frequency of the entire system. To evaluate the shift of the frequency caused by changing the plasma impedance with introducing 5 nl droplets, the frequency shift in the free-running ICP was measured. In the case of Ar-ICP, the frequency increased by 17.3 khz from the base frequency, and then returned to the base frequency in 130 ms. The excitation temperature was about 3000 K decreased and then became about 4000 K increased rapidly. When the same measurement was performed in the case of He-ICP, the resonant frequency decreased by 3.4 khz, and then returned in 24 ms, the excitation temperature was about 500 K increased and then 1000 K decreased. In addition, the frequency fluctuation was increased due to droplet volume in both cases. The cause of the frequency-shift characteristics was also discussed by using an electric circuit simulation. The results showed that the difference of the frequency sifts tendencies between Ar and He ICP can be explained based on the cappling system for RF-power energy transfer. Keywords: ICP; free-running; resonant frequency; temperature sift; plasma stability.

X線分析の進歩36 別刷

X線分析の進歩36 別刷 X X X-Ray Fluorescence Analysis on Environmental Standard Reference Materials with a Dry Battery X-Ray Generator Hideshi ISHII, Hiroya MIYAUCHI, Tadashi HIOKI and Jun KAWAI Copyright The Discussion Group