i
ii
1 6 9 12 15 16 19 19 19 21 21 22 22 23 26 32 34 35 36 3 37 5 5 4 4 5 iii
4 55 55 59 59 7 7 8 8 9 9 10 10 1 11 iv
ozein Van Marum 1801 Cruiokshank Marum 1840 Schonbein 3 / atm 1
N 1892 50 1960 1970 2
3
V ( ) 4
SiO 2 5
O O O 2 ev O O 2 O O 2 O + O kcal O + O 2 O 3 + kcal ( ) O 2 O 68 kcal O kcal O 3 g Wh ns 6
7 e e e cm
O 8
3 (1) 9
g N g Nm 3 /N Hz 10
g Wh s 30 V A ( ) (ns) C A/ m 2 J/ ( ) V ev 11
140 W.V.Siemens 5 tan 12
- 13
( ) 14
15
16
F mm (a) (b) 2 Hz 17
cm cm cm cm 18
Vd Vi 5 nm I T log(i0 I ) 19
Ts 20
= A I log 0 C Ts I x I0 x Vi V 0.11MPa M a M a min i min 21
4 3 2 0 0.2 0.4 0.6 0.8 1 22
(a) (b) (a) (b) 23
0.2L/min V C C N C g N DS AS 2.5 2 1.5 1 3 3.5 4 4.5 5 24
200 150 100 50 0 0.5 1 1.5 2 2.5 25
M a C Q min 6 5 4 3 2 1 0 0.2 0.4 0.6 0.8 1 26
C E 10 1 0.2 0.4 0.6 0.8 1 ( ) M a C Pac 1mm Q min 27
M a g=0.5mm 7 6.5 6 5.5 5 4.5 4 0 0.2 0.4 0.6 0.8 1 ( ) 28
g=0.5mm 0.6L M a Nm ac 300 200 100 0 0.2 0.4 0.6 0.8 1 ( ) 29
M a /Nm η ac 5 300 250 200 150 100 50 0 0.2 0.4 0.6 0.8 1 30
3 60 10 Q C η = ( g / kwh) Pac min 31
V C Nm 3 32
2.5 2 1.5 1 0.5 0 3 3.5 4 4.5 5 33
34
35 Nm kwh
cm cm cm 1 36
5 AC I V Cc Cg Vc Vg 37
V Vc Vg Vg Vd = Vc + I Vc = ω Cc I Vg = ω Cg Cc C εε S Cc = 0 d ε 0 S Cg = d S Vc 1 = Vd 1+ ε Vg ε = Vd 1+ ε Vc Vg 38
min 4 3 2 1 0 1 10 100 1000 10000 39
(1) Vi(glass) Vg glass Vi glass V ε glass Vg ( glass) = Vi( glass) = 1.85( kv ) 1+ ε glass Vg Vi( ) 1+ ε 1+ ε Vi( ε ) = Vg ( glass) = 1.85 ( kv ) ε ε 40
1.1 ~ 1.5 1 0.5 0 0 1 2 3 4 5 41
1000 100 10 1 0 1 2 3 4 5. 42
43
10000 1000 100 10 1 10 100 1000 10000 44
, e e e.. e 11 10 - exp (-2060/T)cm 3 / 11 ( ) 10 i 12 W = 1 CcVc 2 ( ) 2 J 12 45
80 60 40 20 2 1 0 0 10 100 1000 10000 46
1000 800 600 400 200 0 1 10 100 1000 10000 min 47
Vd k Pr I I C δ R C I ϕ V I R (a) (b) P P = VI cos ϕ I = I cos ϕ ω C 2 I = sin ϕ cos ϕ ω C 2 I ε Vd= V 48
K K ac 10 1 0.1 0.01 0.001 0.01 0.1 1 49
Id g 300 200 100 0 0.001 0.01 0.1 1 50
300 200 100 0 0.01 0.1 1 10 51
300 200 100 0 10 100 1000 52
53
54
55
2 56
57
2 3 58
1 3 2 1 0 3 3.5 4 4.5 5 1 59
2 1 1 3 60
1 2 2 1 N 2 1 2 8 6 4 2 0 2.5 3 3.5 4 4.5 5 5.5 2 61
10 8 6 4 2 0 2.5 3 3.5 4 4.5 5 5.5 3 62
2 3 10 8 6 4 2 0 3 3.5 4 4.5 5 5.5 63
2 1 1 2 1 3 2 5 1 3 1 64
2 8 6 4 2 0 2.5 3 3.5 4 4.5 5 5.5 2 65
8 6 4 2 0 3 3.5 4 4.5 5 5.5 3 66
1 5 1 3 1 67
10 8 6 4 2 0 3 3.5 4 4.5 5 5.5 2 2 3 68
8 6 4 2 0 3 3.5 4 4.5 5 5.5 2 69
10 8 6 4 2 0 3 3.5 4 4.5 5 5.5 3 70
Vd V L n 8 7 6 5 4 3 2 1 2 3 71
1 2 3 1 2 3 2 2 1 3 3 72
10 8 6 4 2 0 0 100 200 300 400 500 73
10 8 6 4 2 0 0 100 200 300 400 500 74
8 6 4 2 0 0 100 200 300 400 2 75
10 8 6 4 2 0 0 100 200 300 400 500 3 76
1 2 3 2 3 2 3 2 2 2 1 77
3 3 3 300 200 100 0 0 2 4 6 8 10 78
300 200 100 0 2 4 6 8 10 79
300 200 100 0 2 4 6 8 10 2 80
300 200 100 0 2 4 6 8 10 3 81
2 1 2 3 2 3 82
2 3 2 1 1 3 20 15 10 5 TiO 2 signle barrier t=1mm g=1 mm p=0.11 MPa 0 2 2.5 3 3.5 4 83
40 30 20 10 0 2 2.5 3 3.5 4 2 84
40 30 20 10 0 2 2.5 3 3.5 4 3 85
40 30 20 10 0 2 2.5 3 3.5 4 86
2 3 2 2 3 1 1 2 2 1 2 1 87
3 1 3 3 40 30 20 10 0 2 2.5 3 3.5 4 2 88
40 30 20 10 0 2 2.5 3 3.5 4 3 89
40 30 20 10 0 2 2.5 3 3.5 4 90
40 30 20 10 0 2 2.5 3 3.5 4 2 91
40 30 20 10 0 2 2.5 3 3.5 4 3 92
n 2 1 2 2 3 2 3 1 3 1 35 30 25 20 15 10 1 2 3 93
1 1 94
35 30 25 20 15 10 5 0 0 1 2 3 4 5 6 95
35 30 25 20 15 10 5 0 0 1 2 3 4 5 6 96
35 30 25 20 15 10 5 0 0 1 2 3 4 5 2 97
35 30 25 20 15 10 5 0 0 1 2 3 4 5 6 3 98
3 3 3 Nm 3 2 1 99
2 8 1 100
300 250 200 150 100 50 0 0 10 20 30 101
300 250 200 150 100 50 0 0 5 10 15 20 25 30 35 102
250 200 150 100 50 0 0 5 10 15 20 25 30 2 103
250 200 150 100 50 0 0 5 10 15 20 25 30 35 3 104
105 1
1 1 106
1 107
5 108
109
1 110
1 111
112
(1) C.F.Schonbein,Comptes Rendus Hendus Heebd. Seances Acad Sci., 10, 706 (1940) (2) p.275 (S-35) (3) 127 (1982-2) (4) p.180 1995-9 (5) Vol.114-D No.4 pp.362-369 (1994-4) (6) : Vol.114-D No.4 pp.353-356 (1994-4) (7) Vol.114 No.10 pp.635-636 (1994) (8) Vol.114 No.10 pp.637-639 (1994) (9) (1993) (10) Vol.28 No.2 pp.114-119 (2004) (11) 2002 (12) (2003) (13) p.103 ( ) H 8 (14) S.Masuda,K. Akutsu, M.Kuroda, Y.Awatsu, and Y.Shibuya IEEE Trans. IAS, Vol.24 pp.223-231(1988) (15) Vol.113-A No.8 pp.556-571 (1993) (16) S.Ushiroda, N. Yamazaki, S. Kajita, T.Tamada and Y.Kondo, 11 th Int. Conf On Gas Discharge and Their Application, 113
Tokyo, 324 (1998) (17) 4 10 pp 1133-1138 (1998) (18) 74 pp.134-139 (1998-2) (19) 74 10 p. 1118 (1998-10) (20) 114 10 pp 640-644 (1994-10) (21) D 114 4 pp 357-361 (1994-4) (22) J.C.Devins, J.Electrochem. Soc., 103, pp.460-466 (1956) (23) 96 (H-8 ) (24) 431 (1994) (25) Vol.19, No.5 pp.369-374 (1995) (26) B.Eliason,M.Hirth and U.Kogelschatz: J.Phys. D: Appl Phys. 20 (1987) 1421 (27) p.24(1993) (28) Vol. 3 pp 120 124 2000-3 (29) A-116 1996 121 (30) A Vol.120 No.6 pp 695-700 (31) P58, 114
(32) A-117 No.11 1997 1103 (33) A-117 No.6 1997 565 (34) Vol.74 No.10 pp.1127-1132 1998 10 (35) SAMARANAYAKE Janaki, Vol 74 No.10 pp 1139 1143 1998-10 (36) 1986 197 (37) W.V.Siemens Pogg. Ann. Chemi.,102 66(1857) (38) Vol. No.6, 521( ) (39) 127 (19829 (40) Vol. No pp 150-150 1976- (41) B Vol.96 No.11 pp 569-574 1976-11 (42) 127 p.7 (1982) (43).116 A, No.2 pp.121-127 1996 (44) Vol.120 A, No.6 pp.695-700 (2000) (45) 122-A, Vol.122-A, No.4 pp.378-383 (2002) (46) Vol.121-A, No.4, pp.366-371 (2001) (47) Kazuyuki Ohe, Kiyohito Kamiya and Takashi Kimura IEEE TRANSACTIONS ON PLASMA SCIENCE Vol.27, No.6, 115
pp.1582-1586, December (1999) 8 9 ED-00 110 pp.35-38(2000) (50) ED-02-116 pp.51-55(2002) (51) V.I.Gibalov,M.Wronski,V.G.Samaylavich,T.Opalinske L, pp.151-156 (1989-9) (52) pp.77-80 (1994-3) (53) p.245 (1960) (54) 127 p.7 1982 (55).24, No.3 pp.128-133 )(2000) (56) p.506 (1990-7) (57) PST 02 133 pp.13 17 (2002) (58) 20 (SPP 20) BI 3 pp.29 30 (2003) (5 ) (60) Vol.97 No.2, pp.48-52 (S52-1) 116
(61) Vol.97, No.11 pp.665-670 (S52-11) (62) U.Kagelschatz : Proc. 16 th Int. Conf. Phenomena Ionized Gases, p240(1983). (63) B.Eliasson, M.Hirth and U.Kagelschatz : J.Phys.D, 20(1987)1421. (64) U.Kagelschatz :Process Technology for Water Treatment, S.Stucki, ed. New York, p.87 (1988). (65) M.Kuzumoto, Y.Tabata, K.Yoshizawa and S.Yagi : Trans. Inst. Elect. Eng. Jpn., 116 (1996)121. (66) Y.Noma, K.Goto, Y.Yamagata and K.Ebihara : Trans. Inst. Elect. Eng. Jpn., 121A(2001)366. (67) J.C.Devins : Electrochem. Soc., 103(1956)460. (68) S.Yagi and N.Tanaka : J.Phys.D, 12 (1979)1509. (69) K.Ohe, K.Kamiya and T.Kimura : IEEE Trans. Plasma Sci., PS-27(1999)1582. (70) B.Eliasson and U.Kagelschatz: Electrical discharge in oxygen, BBC Brown, Boveri snd Co., Ltd., Barden, Brown Boveri Research Rep. KLR86-11C, 1986. (71) M.Toyofuku,Y.Ohtsu and H.Fujita:J.Journal of Applied Phyics Vol.43, No.7A, pp.4368-4372 (2004) (72) Y.Ohtsu M.Toyofuku and H.Fujita:Proc.of Third Asia-Pacific International Symposium on the Basic and Application of Plasma Technology pp.186-190 (2003) (73) M.Toyofuku,Y.Ohtsu and H.Fujita:Proc.of 7 th Asia Pacific Conference on Plasma Science and Technology Symposium on 17 th Plasma Science for Materials, 01P-47 p401(2004) (74) Dhandapain and S.T.Ohyaa:Appl. Catal. B11 (1997) 129 (75) 117
. (76) M.Toyofuku,Y.Ohtsu and H.Fujita:Proc.26 th International Conferenc on Phenomena in Ionized Gases, pp.215-216 (2003) (77) P2-2 pp.276-277 (2004) (78) B.Elasson and U.Kagelschatz: Electrical Discharge in Oxygen(Boveri and BBC, 1986) (79) N.Tabata: J.Plasma Fusion Res., 74 (1998)1119. (80) G.E.Caledonia, Chem.Rev., 75(1975)333. (81) U.Kogelschatz, Plasma Chem. Plasma Process., 23, (2003)1. 118
119