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1 2004 SPring /6/21
2
3 CMOS nm (nm) High-performance Logic Technology Requirements (ITRS 2003) 10
4 Photoelectron Intensity (arb.units) CTR a-sio2 0.1 HfO Si (b) Hf 3d (c) O 1s 0.74eV 0.83eV 0.58eV annealed, Si/SiON/HfO 2 X XAFS Hf-L edge XAFS annealed, Si/SiO 2 /HfO 2 TaOxSi TiN Si/SiO 2 /HfO (kev)(a) Si 1s Binding Energy (ev)
5 SiO nm 1nm SPring-8
6 /Si 1.0 Si-1s HfSi Normalized intensity Si 4+ SiO2/Si HfSiO annealed As-dep Binding energy (ev) 6 kev X-ray HfO2 Si e SiO2 SiON 4nm 0.8nm SiONSiO2 HfO2/Si JASRI/SPring-8 K.Kobayashi et. al., Appl. Phys. Lett. 83 (2003) 1005.
7 Si Normalized intensity (a.u.) Oxidized Si 4+ p-si(620)/hfalo I/I and annealing p-si(590)/hfalo I/I and annealing Take-off angle 86 kev X-ray e Poly-Si(5nm) HfAlO(2.7nm) SiON(0.7nm) Kinetic energy (ev) Si Si 1s JASRI/SPring-8 SELETE E.Ikenaga et. al., IWDTF (26 May 2004)
8 Si / Integral Intensity 590 Al I/I and annealing 590 Al 590 Si I/I and annealing 590 Si 620 Al I/I and annealing 620 Al 620 Si I/I and annealing 620 Si Poly-Si(5nm) HfAlO(2.7nm) SiON(0.7nm) Take Off Angle () Si 4+ Si Si HfSiON HfAlO620 B HfAlO590 B 620 JASRI/SPring-8 SELETE E.Ikenaga et. al., IWDTF (26 May 2004) Si Poly-Si(5nm) HfSiON(2.6nm) SiO2(0.6nm) Si
9
10 Y. Nishihata et. al., Nature 418 (2002) 164.
11 X Jahn-Teller distortion XAFS O LiNiCoOLi + Ni NiO 6 Li T.Nonaka et al., J. Synchrotron Rad., 8, 869 (2001).
12 XANES absorbance (a.u.) t (a.u.) BaMgAlO 17 :Eu Eu 2+ Eu 3+ pristine Eu 2 O 3 annealed Energy (ev) 6008h EuCl 2 EuCl 3 12h 24h ratio of Eu PDP Eu 2+ Eu annealing temperature () 1 ratio of Eu 3+ X Eu 2+ Eu 3+ Eu JASRI/SPring-8 SPring-8
13
14 SEM fiber (SRI ) The 6 th SPring-8 Symposiun Abstract 11 (2002).
15 33m
16 33m
17 X 10000) X
18 SPring-8 LSI
19 SPring-8 X X XAFS XANES X TEM SIMS CT X ESCA TEM
20
21 SPring-8
22 X X SC PC
23 (nm) (bit) 4.4 (x10 8 atoms/cm 2 ) G G G 1.8 ITRS N.Awaji et. al., JJAP 43(2004)1644.
24 XCTR SPring-8
25 A B δ δ CTR Si LSI SiON Si Si LSI SPring-8
26 IP SPring-8
27 X X SAXS WAXS 274 mm 174 mm (110) 199 mm (200) Shish-kebab224 mm (110)
28 X CaO Al2O CaO Al2O3 8H2O 1 3CaO Al2O3 6H2O P/C100%
29 C2AH CA(CaO Al2O3) C:CaO A:Al2O3 H:H2O CA C3AH H15 SPring-8 CA C2AH8 C3AH6 + AH3 35 CA C2AH8 C3AH6 + AH
30 2003 CaF2 30cm X H15 SPring-8
31 2003 X=0m X=20m X=40m X=60m X=80m X=100m X=120m X=140m 50 H15 SPring-8
32 SPring-8
33 NEC NTT LSI DVD,CD FPD SPring P&G
34 Face to face
35
36 Gr Gr
37 JASRI
38 JASRI JASRI
39
40 GaInN( / SOI MRAM FPD
41 SR JASRI
スライド 1
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