X線散乱と放射光科学

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1 GM NaI(Tl) YAP (Ce) PIN CCD FOT-CCD X II-CCD X CCD

2 ii CMOS CMOS SOI µ-pic

3 9 X 1 3) X X ZnS CdS X X X X X X X X 1 1 X X X position sensitive detector 9.1 X, µ-pic X CCD CMOS

4 CCD W 30 ev anode cathode 1 1 avalanche 1 GM 1

5 l ionization chamber Ar N Ar +N Xe Kr 1 XAFS E n n i n = W i Ee 1 e µl (9.1) W W e µ l l = 5

6 ) 9.4 cm 8 kev n [photons/sec] = i [na] (9.2) 5 % 1 pa photons/sec 3, 4) () A, B (A B)/(A + B) (A + B) 9.3) XAFS (Lytle) 5) 9.4 Fe Kα Fe Kβ Mn proportional counter, PC V

7 CuK 9.7 a: NaI b: Si(Li) c: (Xe). Be Al Ar Kr Xe 1 CH 4 CO 2 quenching gasar 90% CH 4 10% PR P-10 CuKα 8 kev Ar W = 26.4 ev 300 Xe W = 22.0 ev 360 W 1 X 20 30µm

8 E = 20 kev E = 1 2 kev 9.6 CuKα E/E 20 % % Ag Mo Kα Kr 0.3 nm Al 1 µm dead time 0.2 µs cps counts per second plateau 9.8 X 6) 9.9

9 time-to-amplitude converter TAC i x i Q i Q i x i / Q i i i 9.10 Q Q A = Q(l x)/l, Q B = Qx/l (9.3) l, A x V A V B V A /(V A + V B ) = (l x)/l (9.4)

10 ) Q A, Q B (Q A Q B )/(Q A + Q B ) 5 10 cm mm CuKα 10 4 cps % X 7) (self-quenched streamer (SQS) mode detector) X 9.11 (2) 10 S/N cm 6.5 cm cps 10 5 cps CuKα Ar(85 %) C 2 H 6 (15 %) MoKα Kr(85 %) C 2 H 6 (15 %) 6 10 kv 1968 (G.Charpak) multiwire proportional counter, MWPC 8). 9). point spread function FWHM 0.6 mm

11 GM GM (Geiger-Müller () counter) 9.1 GM Ar GM µs 1000 cps GM NaI(Tl) X scintillation counter, SC) scintillatorphotomultiplier tube 9.12 NaI Tl photocathode V 100 ev CuKα 8 kev NaI Tl 410 nm 3 ev % 10 % 25 E = 20 kev E = 6 kev CuKα E/E 40 % nm nm 0.2 µs

12 Si(Li) pilot U, NE101 BaF 2 1 ns YAP (Ce) YAP Y Al YAlO 3 Ce YAP(Ce) NaI(Tl) (g/cm 3 ) YAP(Ce) YAP(Ce) NaI(Tl) 40 % 25 ns 230 ns YAP(Ce) kev /s 84 ns YAP 1 mm 1 mm 6 mm () YAP mm 128 mm 1 mm 10) semiconductor detector SSD solid state detector 9.13 depletion region

13 (a) Si(Li) (b) Ge(Hp) 11) Be ) Si Ge mm 100 ns 1 (ε) Si 3.76 ev Ge 2.96 ev

14 360 9 ε W 1/10 10 γ Si(Li) Li drift type Ge(Hp), intrinsic type Si(Li) 5 mm 9.13 Li n p Si np Li + p p n Li intrinsic i n + -i-p Ge(Hp) Li Eleven nine twelve nine hyperpure Ge Si(Li) Ge(Hp) 13) Fe MnKα 5.90 kev E = 160 ev E/E 0.03 Kα, X 9.14 Si(Li) 30 kev 5 20 kev 100 %, Ge(Hp) γ Ge K (11.01 kev) 10 µs AD 10 4 cps 9.15 (77 K) FET () 14) Ge (55.5 mm 50.5 mm 6 mm) 128 ( 5 mm, 350 µm) CdTe CdTe 60 kev 100 kev (silicon drift detector SDD) ) 9.16 n p n n p

15 ) p + n PIN 18) 10 6 cps ( 20 C) Si(Li) 16, 17) X pn pin pn X pin (1) (2) PIN PIN intrinsic p n p + -i-n + 18) ( 9.17) 100 µm ns

16 ) π p n p avalanche photo-diode, APD 19 21) 9.18 p + n pn p π pn ns 100 µm S2384 APD 14.4 kev 22) Fe 0.3 ns AgBr X Ag Br K nm nm 23) X IX150, IX100, IX80 IXFR IX150 µm 0.2 mm µm 9.19 D

17 α log E1 log E2 log E 9.19 E E D L 0 L D = log 10 L 0 L % 1% 9.19 E 1 E 2 α (9.5) γ = tan α (9.6) γ X reciprocity law nuclear plate µm Ilford L4 0.2 µm µm 50 µm ( ) (GAFCHROMIC Film)

18 ) 9.5 imaging plate, IP (photostimulated luminescence) ) 25, 26) (BaFBr: Eu 2+ ) Eu 2+ Eu 3+ Br F 12 Eu 3+ Eu nm, 0.8 µs He-Ne 633 nm AD 1) mm 2, mm 2 2) mm 2, 150 µm 0.15 mm

19 ) ) 8 20 kev 100 % 4) CuKα mm ) / IP 9.22 R-AXIS V IP IP IP IP IP IP 2 IP mm µm 30 sec

20 ) 1 40 sec mm CCD PbO PbO Se-As (SATICON) 29) PbO 25 µm 6 µm 25 mm

21 X HARP-FEA 33) NHK (HARP, High-gain Avalanche Rushing amorphous Photoconductor) (HARPICON) 31) 9.23 Se 30, 32) HARP (FEA, Field Emission Array) HARP-FEA 20 µm 20 µm, , 12.8 mm 9.6 mm 9.24 HARP Se ( 15 µm) 33, 34) HARP-FEA CCD CCD charge coupled device ) CCD 9.25 p Si (SiO 2 ) MOS(metal oxide semiconductor, ) 10 V pixel µm

22 CCD 9.26 FOT-CCD (a) 36) 50 C 1 10 full-frame transfer type interline transfer type 100 % CCD CCD CCD CCD CCD mm FOT-CCD FOT-CCD fiber-optics taper FOT CCD 9.26(a)Gd 2 OS 2 Tb FOT

23 e e 9.27 X II-CCD Amemiya CCD 37) CCD FOT FOT-CCD CCD FOT-CCD X II-CCD X X II-CCD X X-ray image-intensifier X II CCD 9.27 Be CsI Na RbCsSb X CCD X II-CCD 150 mm 230 mm CCD FOT X II 9.28 CCD 1 µm 1 µm LSO (Lu 2 SiO 5 :TbCe), 10 µm P43 (Gd 2 O 2 S:Tb) CCD 10 µm

24 ) 9.30 S / N 36) (3 kev 10 kev) 38) CCD CCD IP IP 1980 IP CCD 1990 IP IP 36, 39) 9.8.1(2) CCD

25 R( ) R T T(K) FOT-CCD SC 9.30 S/N S/N S/N 39) 9.7 kev S X 10 kev X J, 0.1 kev J transition edge sensor, TES (microbolometer) (microcalorimeter) 40) 9.31 T R 9.32 X X T K 1 mm 3 Si C J/K 10 kev X E T = E/C 2.7 mk X (EDS) 5 ev

26 superconducting tunnel junction, STJ Nb/Al/AlO x /Al/Nb/ 1 nm AlO x 41) mev 3 ev ev 1 kev X X 9.8 CCD CMOS SOI µ-pic ) Si µm, mm CuKα Si 0.3 mm MoKα Si CdTe wire bonding 1 64 CMOS

27 mm 0.3 mm 0.2 mm 9.33 (PILATUS) 43) (ROIC, readout integrated circuit) ROIC amplifier, shaper, discriminator, counter ROIC % 20 % Paul Scherrer Institute, PSI Swiss Light Source (SLS) PILATUS (Pixel Apparatus for the SLS ) 9.33 pn Si CMOS (ROIC) 15 µm In (bump) (bump bonding) SPring-8 PSI PILATUS PILATUS-100K Si 16 ROIC µm 2, mm 2 94, k, 8 kev 99 % 15 kev 55 % 6 PILATUS-2M 3( ) 8( ) = µm 2, mm 2, = ms 1 30 fps(frames per second) 44, 45) PILATUS XAFS, 55 µm, 75 µm, 130 µm bump bonding

28 374 9 (a) (b) 9.34 (a) (b) Si Si CdTe (XII) CCD (9.6.2(2) ) (flat panel detector,fpd) 46, 47) cm 9.34 Se (thin film transister,tft) TFT ON A/D( / ) C CsI 50µm 50µm, 2240( ) 2344( )= , 112 mm( ) mm( ) 2 /s 48, 49) CMOS CMOS CCD CMOS 50) CMOS (Complementary() Metal Oxide Semiconductor( )) CCD CCD CMOS CMOS MOSFET( ) ) CMOS CMOS 1 C10158DK

29 µm 100µm 200µm 10µm Xe:C 2 H 6 180µm 9mm 1µm ) SOI LSI SiO 2 SOI (Silicon-On-Insulator ) SOI 51) 10 µm ns MWPC 1 mm micro pattern gas detector, MPGD ) microstrip gas chamber, MSGC 52, 54) µm MSGC MWPC 9.36 MSGC kv/cm

30 mm Xe : C 2 H 6 4 mm 4 mm 100µm 30µm ) 10 cm 10 cm, 1024 < 100 µm (rms), 100 ns microgap gas detector RAPID (Refined ADC Per Input Detector) 55) SPring-8 RAPID 56) Cu 0.8 mm 10µm ϕ W 0.8 mm 0.5 mm ( ) AD 20 µs 20 cm 10 7 µ-pic MSGS µ-pic (micro pixel chamber) 13, 57) µm 400 µm µ-pic 10 cm 30 cm, 10 7 cps, 100 µm, < 100 ns, > 10 6

31 µm 400µm 100µm 50µm 9.37 µ PIC 13) preamplifier main amplifier linear amplifier X 0 10 V single channel pulse height analyzer pulse height discriminator V B V W differential lower level V B upper level V B + V W 2 1 V W V B integral V B V B ratemeter

32 a b a b 9.40 AD chart recorderscaler timer printer 2 1 fixed time mode 1 fixed count mode X SSD 9.38 multi-channel analyzer MCA multi-channel pulse height analysis PHACRT(cathode-ray tube) AD analog-to-digital converter AD

33 Wilkinson AD 50 MHz µs AD µs MCA AD µs multi-channel scaling MCS X AD t 1 t 2 t 2 X 1 dwell time t X NIM nuclear instrument module bin BNC CAMAC computer aided measurements and control ) η η = η X detective quantum efficiency, DQE) (9.7) DQE = ( ) 2 /( ) 2 ( ) 2 /( ) 2 (9.8) DQE X N n, 9.8 DQE = n2 /( n) 2 ( N ) 2 = n N 2 N / (9.9) 9.7 η DQE

34 V E FWHM full width at half maximum V E ( V/V ) 100 % = ( E/E) 100 %, 1 X (dead time) ( ) τ ( MCA )X 1, 2, 22) N N 0 Nτ N 0 Nτ N 0 = N N 0 Nτ N 0 = N 1 Nτ N = N N 0 τ (9.10) τ 0.1 µs 10 5 cps 1% 10 6 cps 10 % SSD τ 10 µs 10 4 cps 10 % N N 0

35 N = N 0 e N 0τ (9.11) (9.10) (9.11) (N 0 1/τ) 58) n n Poisson distribution n > 20 Gaussian distribution { } p(n) = 1 (n n)2 exp 2π n 2 n p(n) = nn exp ( n) (9.12) n! (9.13) x standard deviation σ m { } p(x) = 1 (x m)2 exp 2πσ 2σ 2 (9.14) σ = n m = n 9.42 p(x) m σ m + σ 68.3 % m σ m σ 50 % m 1.96 σ m σ 95 % (full width at half-maximum, FWHM) 2 2 ln 2 σ = 2.35 σ σ standard error σ probable error n σ = n, rms root-mean squared value 1 n n n

36 382 9 n n ± n n/n = 1/ n N = 10 2, 10 3, % 3 % 1 % t n t N n j (j 1, 2,, N) n = 1 N N n i, σ n = 1 N n i = N i=1 i=1 n N (9.15) t G G t B B counting rate r = G t G B t B, σ r = G t 2 + B G t 2 B (9.16) N G j B j (j 1, 2,, N) r = 1 N G i i t G B i i t B, σ r = 1 i N t 2 G G i + B i i t 2 B (9.17) σ r / r = 1/ G i (9.18) i ( ) X X X X escape peak 9.41 Ge X 11 kev GeKα X Kr MoKα pile up M 2M 2 M i M j M i + M j sum peak

37 1) Glenn F. Knoll (2001). 2) (2011). 3) E. Gatti and P. Rehak: Nucl. Instrum. Methods A 225 (1984) ) 69 (2000) ) F. W. Lytle, R. B. Greegor, D. R. Sandstrom et al.: Nucl. Instrum. and Methods 226 (1984) ) 24 (1985) ) 21 (1990) 13. 8) G. Charpak, R. Bouclier, T. Bressani et al.: Nucl. Instrum. and Methods 62 (1968) ) 18 (1976) ) M. Suzuki, H. Toyokawa, M. Mizumaki et al.: Nucl. Instrum. and Methods A (2001) ) Catalog 91/92, Oak Ridge Co.Publ. EG & G ORTEC Detectors & Instruments for Nuclear Spectroscopy 12) A. H. F. Huggleton: Nucl. Instrum. and Methods 101 (1972) ) T. Nagayoshi, H. Kubo, K. Miuchi et al.: Nucl. Instrum. and Methods A 513 (2003) ) H. Toyokawa, M. Itoh, M. Mizumaki et al.: Nucl. Instrum. and Methods A 467 (2001) ) P. Lechner, C. Fiorini, R. Hartmann et al.: Nucl. Instrum. and Methods A 458 (2001) ) 38(2) (2007) 6. 17) 21 (2008) ) 14 (2001) ) P. Webb and A.R. Jones: IEEE Trans. Nucl. Sci. NS 21 (1974) ) 5 (1992) ) 21 (2008) ) C. S. G. Cousins: J. Appl. Cryst. 27 (1994) ) K. Sato, H. Toyokawa, Y. Kohmura et al.: SPIE Proc (1999) ) 35 (1993) ) 29 (1994) ) 22 (2009) ) M. Sonoda, M. TaKano, J. Miyahara and H. Kato: Radiology 148 (1983) ) 145 B 29) 24 (1982) ) K. Umetani, H. Ueki, K. Ueda et al.: J. Synchrotron Rad. 3 (1996) ) 71 (2002) ) 14 (2001) 280.

38 384 33) : No.27, 3 (2008) 1. 34) T. Miyoshi, N. Igarashi, N. Matsugaki et al.: J. Synchrotron Rad. 15(2008) ), 13 (2000) ), 45 (2003) ) 22 (2009) ) 69 (2000) ) PF News 19 (2002) ) 72 (2003) ) 51 (1996) ). 43) E.F. Eikenberry: X-ray Detector Development at the SLS, SPring-8 Seminar, 18, ) 22 (2009) ) SPring-8 14 (2009) ) 92 (2005) ) 66 No.7 (2011) ) 49) N. Yagi, M. Yamamoto, K. Uesugi and K. Inoue: J. Synchrotron Rad. 11 (2004) ) K. Hasegawa, K. Hirata, T. Shimizu et al.: J. Appl. Cryst. 42 (2009) ) 65 (2010) ) 55 (2000) ) A. Oed: Nucl. Instrum. Methods A 263 (1988) ) T. Tanimori, A. Ochi, S. Minami and T. Nagae: Nucl. Instrum. Meth. A 381 (1996) ) R. A. Lewis, A. Berry, C. J. Hall et al.: Nucl. Instrum. and Methods A 454 (2000) ) 19 (2006) ) 22 (2009) ) T. Ida and Y. Iwata: J. Appl. Cryst. 38 (2005) 426.

39 µ-pic A AD (analog-to-digital converter) 379 C CCD(charge coupled device ) 367 CdTe 360 CMOS(Complementary() Metal Oxide Semiconductor) 374 CMOS 374 F FOT-CCD 368 G GM (Geiger-Müller () counter) 357 GM 350 N NaI(Tl) 357 P PIN 361 S SOI 375 X X II-CCD 369 HARP-FEA 367 PbO (SATICON) Y YAP (Ce) 358 (avalanche photo-diode, APD) 362 CCD 369 (position sensitive detector) (imaging plate, IP) (interline transfer type) 368 (Wilkinson) 379 (escape peak) 382 (Gaussian distribution) 381 (probable error) (GAFCHROMIC Film) 363 (CAMAC computer aided measurements and control ) 379 ( ) 366 CCD 368 (depletion region) 358 (nuclear plate) 363 (Ge(Hp), intrinsic type) (sum peak) ( ) 363 ( ) 363 (main amplifier) 377 (silicon drift detector SDD) 360 (single channel pulse height analyzer) 377 (intrinsic i) (integral 377 (preamplifier) (transition edge sensor, TES) 371 (superconducting tunnel junction, STJ) 372 ( ) 366 CCD 369 (fixed time mode) 378 (fixed count mode) ( avalanche) 350 (ionization chamber, ) (NIM nuclear instrument module ) 379 (HARP, High-gain Avalanche Rushing amorphous Photoconductor) (pile up) 382 (pulse height discriminator) (full width at half-maximum, FWHM) 381 (semiconductor detector) 358 (pixel) 367 (differential) 377 standard deviation) 381 (proportional counter, PC) 352 (linear amplifier) (dead time) 354, 380 (flat panel detector,fpd) 374

40 386 (plateau) 354 (full-frame transfer type) 368 (Poisson distribution) (microgap gas detector) 376 (microstrip gas chamber, MSGC) 375 (micro pattern gas detector, MPGD) 375 (multi-channel scaling MCS) 379 (multi-channel analyzer MCA) 378 (multiwire proportional counter, MWPC) 356 (Lytle) 352 (Si(Li) Li drift type) 360 CCD 369

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